Dutch lawmakers have asked the government whether it is engaging with the United States and other partners over the proposed U.S. MATCH Act, a bill introduced in Congress that would tighten export controls on semiconductor manufacturing equipment and could extend equivalent restrictions to suppliers in allied countries including the Netherlands and Japan.
Parliamentary questions submitted on April 10 said the measure could in practice block ASML from selling immersion deep ultraviolet lithography systems to China and from providing maintenance and other servicing for machines already installed at Chinese customers including SMIC, Hua Hong, Huawei, CXMT and YMTC. Lawmakers also asked whether a servicing ban on previously delivered systems could create contractual, legal and economic risks for ASML and what the consequences would be for the Dutch supplier base and employment.
Under the bill, U.S. agencies would identify covered equipment and facilities, pursue diplomatic alignment with allied supplier countries and, if that process fails, issue regulations to apply controls to covered equipment exported from those countries and require licenses with a denial policy for servicing applicable items at covered facilities. The bill explicitly includes all deep ultraviolet immersion photolithography machines within its minimum scope and defines servicing broadly to include installation, calibration, repair, software and firmware updates, training and process support.
ASML has said its 2026 guidance range includes uncertainty related to ongoing export-control discussions. The company reported China accounted for 33% of revenue in 2025 and said that share was expected to fall to about 20% in 2026, while installed base management revenue reached €2.488 billion in the first quarter of 2026.